To analyze forward-biased p-n junction diode behavior, we examine barrier height and depletion layer width:
A p-n junction diode combines p-type and n-type semiconductors. A built-in potential barrier forms at the junction, impeding charge carrier movement. Barrier height represents the energy threshold charge carriers must surpass to traverse the junction.
When a diode is forward biased:
Consequently, forward bias results in a reduction of both barrier height and depletion layer width. The conclusion is:
Both the barrier height and the depletion layer width diminish.
Extrinsic semiconductors are made by doping pure or intrinsic semiconductors with suitable impurity. There are two types of dopants used in doping, Si or Ge, and using them p-type and n-type semiconductors can be obtained. A p-n junction is the basic building block of many semiconductor devices. Two important processes occur during the formation of a p-n junction: diffusion and drift. When such a junction is formed, a ’depletion layer’ is created consisting of immobile ion-cores. This is responsible for a junction potential barrier. The width of a depletion layer and the height of potential barrier changes when a junction is forward-biased or reverse-biased. A semiconductor diode is basically a p-n junction with metallic contacts provided at the ends for application of an external voltage. Using diodes, alternating voltages can be rectified.