Question

The uses of silicon dioxide in modern integrated circuit fabrication process :
• [A.] To serve as mask against diffusion of dopants into silicon
• [B.] To provide surface passivation
• [C.] To isolate one device from another device
• [D.] To act as a component in MOS structures
• [E.] To provide electrical isolation of multi-level metallization systems Choose the correct answer from the options given below :

• A. A, B, C, E
• B. A, B, C, D, E
• C. A, B, C, D Only
• D. A, B, C Only

Hint:

Major uses of \(SiO_2\):
• Diffusion masking
• Surface passivation
• Device isolation
• MOS gate oxide
• Interlayer insulation

Answer 1

The Correct Option is B