Understanding the Question: The question asks for the specific wavelength of light used in modern EUV lithography systems to print nanoscale features on silicon.
Key Formulas and approach: Resolution in lithography is limited by the wavelength of light ($\lambda$). To print smaller transistors, the industry must use shorter wavelengths.
Detailed Solution:
Step 1: The shift to EUV. Traditional lithography used 193 nm light. To move beyond the 10nm node, the industry adopted Extreme Ultraviolet (EUV) light.
Step 2: Standardization. The industry standardized on a specific emission peak generated by laser-produced tin plasma.
Step 3: The specific value. This wavelength is approximately 13.5 nm. It is so short that it is absorbed by air and glass, requiring the use of vacuum chambers and mirrors.
Conclusion: The standard wavelength for EUV lithography is 13.5 nm.